Thermal Stress Analysis for the Low-k Dielectric Layers of Cu Interconnects in a 45 nm Chip

Lin Lin,Jun Wang,Lei Wang,Wenqi Zhang
DOI: https://doi.org/10.13290/j.cnki.bdtjs.2017.01.010
2017-01-01
Abstract:The fragile low-k dielectric layers of Cu interconnects in an advanced chip are prone to failure damage due to the higher thermomechanical stress during the chip packaging,resulting in a problem of the chip package interaction (CPI).The 3D thermal stress analysis for a 45 nm chip was performed by the finite element method with sub-modeling technology and the interconnects were simplified as an effective thin layer in the global model.The effects of PI opening,copper pillar diameter,solder height and Ni-layer thickness on the stress in the low-k dielectric layers of Cu/low-k interconnects during the flip-chip reflow process of the chip were studied by this method.The analysis results show that the stress of the low-k dielectric in the middle layers of interconnects is in high failure risk due to the relatively higher stress,which is consistent with the reported experimental results.The effects of the four factors on the stress in low-k layers can be ranked as:solder height > PI opening > copper pillar diameter > Nilayer thickness.
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