Electro-thermal-stress Analysis of AlGaN/GaN HEMTs Breakdown under Intentional EMI

Liang Zhou,Zhengwei San,Jun-Fa Mao
DOI: https://doi.org/10.1109/rfit.2016.7578210
2016-01-01
Abstract:This paper demonstrated electro-thermal-stress interaction of Gallium Nitride (GaN) high electron mobility transistors (HEMTs) breakdown under intentional EMI. A series of GaN HEMT-based power amplifiers were designed and measured for their reliability. The crack area in the field plate of GaN HEMT was characterized experimentally. Electro-thermal-stress simulation was performed for capturing temperature and stress distributions over the structure so as to understand breakdown mechanism of GaN HEMTs.
What problem does this paper attempt to address?