Measurement of Zno/Al2o3 Heterojunction Band Offsets by in Situ X-Ray Photoelectron Spectroscopy

Lei Hong-Wen,Zhang Hong,Wang Xue-Min,Zhao Yan,Yan Da-Wei,Jiang Zhong-Qian,Yao Gang,Zeng Ti-Xian,Wu Wei-Dong
DOI: https://doi.org/10.1088/0256-307x/30/11/118201
2013-01-01
Chinese Physics Letters
Abstract:ZnO films are grown on c-sapphire substrates by laser molecular beam epitaxy. The band offsets of the ZnO/Al2O3 heterojunction are studied by in situ x-ray photoelectron spectroscopy. The valence band of Al2O3 is found to be 3.59 +/- 0.05 eV below that of ZnO. Together with the resulting conduction band offset of 2.04 +/- 0.05 eV, this indicates that a type-I staggered band line exists at the ZnO/Al2O3 heterojunction.
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