Investigation Of Energy Band At Atomic-Layer-Deposited Zno/Beta-Ga2o3 ((2)Over-Bar01) Heterojunctions

Shun-Ming Sun,Wen-Jun Liu,Yi-Fan Xiao,Ya-Wei Huan,Hao Liu,Shi-Jin Ding,David Wei Zhang
DOI: https://doi.org/10.1186/s11671-018-2832-7
2018-01-01
Nanoscale Research Letters
Abstract:The energy band alignment of ZnO/-Ga2O3 ((2) over bar 01) heterojunction was characterized by X-ray photoelectron spectroscopy (XPS). The ZnO films were grown by using atomic layer deposition at various temperatures. A type-I band alignment was identified for all the ZnO/-Ga2O3 heterojunctions. The conduction (valence) band offset varied from 1.26 (0.20) eV to 1.47 (0.01) eV with the growth temperature increasing from 150 to 250 degrees C. The increased conduction band offset with temperature is mainly contributed by Zn interstitials in ZnO film. In the meanwhile, the acceptor-type complex defect V-zn+OH could account for the reduced valence band offset. These findings will facilitate the design and physical analysis of ZnO/-Ga2O3 relevant electronic devices.
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