Iron-boron Pair Dissociation in Silicon under Strong Illumination

Xiaodong Zhu,Deren Yang,Xuegong Yu,Jian He,Yichao Wu,Jan Vanhellemont,Duanlin Que
DOI: https://doi.org/10.1063/1.4819481
IF: 1.697
2013-01-01
AIP Advances
Abstract:The dissociation of iron-boron pairs (FeB) in Czochralski silicon under strong illumination was investigated. It is found that the dissociation process shows a double exponential dependence on time. The first fast process is suggested to be caused by a positive Fe in FeB capturing two electrons and diffusion triggered by the electron-phonon interactions, while the second slow one would involve the capturing of one electron followed by temperature dependent dissociation with an activation energy of (0.21 ± 0.03) eV. The results are important for understanding and controlling the behavior of FeB in concentrator solar cells.
What problem does this paper attempt to address?