Localized Vibrational Mode Infrared Absorption of BH Pair in Silicon

YC DU,YF ZHANG,GG QIN,SF WENG
DOI: https://doi.org/10.1016/0038-1098(85)90321-7
IF: 1.934
1985-01-01
Solid State Communications
Abstract:High density of BH pair was produced by interaction between atomic hydrogen and boron in B-diffused silicon. The absorption band of BH pair, at 1873cm-1, was first observed using FT-IR spectroscopy. After thermal treatment at 240°C for 30min. the BH pair dissolved and the carrier concentration increased, the hole mobility decreased owing to the increase in ionized impurity scattering, and the 1873cm-1 absorption band disappeared.
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