First-Principles Study of Interstitial Boron and Oxygen Dimer Complex in Silicon

Xianzi Chen,Xuegong Yu,Xiaodong Zhu,Peng Chen,Deren Yang
DOI: https://doi.org/10.7567/apex.6.041301
IF: 2.819
2013-01-01
Applied Physics Express
Abstract:It is newly proposed that the boron-oxygen defect in Czochralski silicon could consist of an interstitial boron (B-i) and an oxygen dimer (O-2i). We have used the density functional theory to study the possible configurations of the BiO2i complex and their induced electronic levels in the silicon band gap. It is found that the most stable configuration of the BiO2i complex is not variable with its charge states. Meanwhile, the electronic level (0/+) induced by the BiO2i complex is calculated to be about E-C - 0.4-0.5 eV. These results are interesting for us to understand the formation mechanism of B-O defects. (C) 2013 The Japan Society of Applied Physics
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