Abstract:We demonstrated a simple and effective approach to fabricate dense and high aspect ratio sub-50 nm pillars based on phase separation of a polymer blend composed of a cross-linkable polysiloxane and polystyrene (PS). In order to obtain the phase-separated domains with nanoscale size, a liquid prepolymer of cross-linkable polysiloxane was employed as one moiety for increasing the miscibility of the polymer blend. After phase separation via spin-coating, the dispersed domains of liquid polysiloxane with sub-50 nm size could be solidified by UV exposure. The solidified polysiloxane domains took the role of etching mask for formation of high aspect ratio nanopillars by O-2 reactive ion etching (RIE). The aspect ratio of the nanopillars could be further amplified by introduction of a polymer transfer layer underneath the polymer blend film. The effects of spin speeds, the weight ratio of the polysiloxane/PS blend, and the concentration of polysiloxane/PS blend in toluene on the characters of the nanopillars were investigated. The gold-coated nanopillar arrays exhibited a high Raman scattering enhancement factor in the range of 10(8)-10(9) with high uniformity across over the wafer scale sample. A superhydrophobic surface could be realized by coating a self-assembled monolayers (SAM) of fluoroalkyltrichlorosilane on the nanopillar arrays. Sub-50 nm silicon nanowires (SiNWs) with high aspect ratio of about 1000 were achieved by using the nanopillars as etching mask through a metal-assisted chemical etching process. They showed an ultralow reflectance of approximately 0.1% for wavelengths ranging from 200 to 800 nm.

Self-Formed High-Aspect-Ratio Polymer Nanopillars by RIE

Self-masked high-aspect-ratio polymer nanopillars.

Fabrication of Submicrometer Inp Pillars by Colloidal Lithography and Dry Etching

Fabrication of High-Aspect-ratio Silicon Nanopillar Arrays with the Conventional Reactive Ion Etching Technique

Wafer Scale Fabrication of Dense and High Aspect Ratio Sub-50 Nm Nanopillars from Phase Separation of Cross-Linkable Polysiloxane/Polystyrene Blend

The Preparation Of Self-Formed Pdms Nanostructures By Rie Etching

Fabrication and Applications of Self-Assembled Nanopillars

Self-Assembling Organic Micro-/Nano-Pillars on Gold and Glass Surfaces

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Fabrication and Characterization of Slanted Nanopillars Array

Fabrication of Length-Controlled Polymer Nanopillars Using Poly(Dimethylsiloxane) Filled Anodised Aluminium Oxide Templates

Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography

Fabrication of ultrahigh-aspect-ratio and periodic silicon nanopillar arrays using dislocation lithography and deep reactive-ion etching

Fabrication of Ordered Arrays of Silicon Nanopillars at Selected Sites

Controlled Fabrication Of Nanopillar Arrays As Active Substrates For Surface-Enhanced Raman Spectroscopy

The Fabrication of High-Aspect-ratio, Size-Tunable Nanopore Arrays by Modified Nanosphere Lithography.