Abstract:The ability to create antireflective super-omniphobic surfaces is important for various optoelectronic applications, which is still a challenge. The combination design of sub-wavelength nanoscale structures for antireflection and re-entrant structures for super-omniphobicity is an effective way to obtain super-omniphobicity and antireflection simultaneously. However, due to the inclination of droplets to strike to the bottom and the complicated craftsmanship, obtaining efficient nanoscale re-entrant super-omniphobic surfaces is difficult, which limits the compatibility of antireflection and super-omniphobicity. Herein, disordered nanoscale T-shape pillars are utilized to obtain the broadband antireflection, non-iridescence, and super-omniphobicity. A simple and repetitive method is reported for large-area scalable fabrication of disordered nanoscale T-shape pillars on glass based on a maskless phase separation lithographic approach. The kinetic roles of Laplace pressure, viscous force, and saturated vapor pressure in the super-omniphobicity are demonstrated by investigating the effect of feature size, interval, area fraction and pillar height of the T-shape nanopillars, liquid surface tension, viscosity, etc. The effects of feature size, interval, and height on the antireflection and the optical behavior on the T-shape nanopillars are also investigated. Although the cap of T-shape nanopillars could bring scattering loss when light touches on the cap range with a large incident angle, broadband antireflection is still obtained. As a demonstration, T-shape nanopillars exhibiting super-omniphobicity (static water contact angle of 160 +/- 1.0 degrees and ethyl alcohol contact angle of 162 +/- 0.5 degrees), high transparency (94%), broadband antireflection (347-780 nm), and non-iridescence are obtained. Our proposed method provides a simple, rapid, and low-cost process to explore the ability of nanoscale re-entrant structures for compatibility of broadband antireflection and super-omniphobicity, with promising practical application in self-cleaning optoelectronic surfaces.

Wafer Scale Fabrication of Dense and High Aspect Ratio Sub-50 Nm Nanopillars from Phase Separation of Cross-Linkable Polysiloxane/Polystyrene Blend

Fabrication of Submicrometer Inp Pillars by Colloidal Lithography and Dry Etching

Fabrication of High-Aspect-ratio Silicon Nanopillar Arrays with the Conventional Reactive Ion Etching Technique

Self-masked high-aspect-ratio polymer nanopillars.

Self-Formed High-Aspect-Ratio Polymer Nanopillars by RIE

Fabrication of ultrahigh-aspect-ratio and periodic silicon nanopillar arrays using dislocation lithography and deep reactive-ion etching

Ultra-high aspect ratio Si nanowires fabricated with plasma etching: plasma processing, mechanical stability analysis against adhesion and capillary forces and oleophobicity

High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Size and Morphology Control of Highly-Ordered Nano-Silicon Pillar Fabricated by Direct Nanosphere Lithography

Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography☆

Fabrication and Characterization of SiO2/Si Heterogeneous Nanopillar Arrays

Phase Separation Of Silicon-Containing Polymer/Polystyrene Blends In Spin-Coated Films

A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application

OS1503 Development of Highly Ordered Silicon Nanowire Array

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

Tailored Nano-Pillar Structures on Surfaces: Facile Formation and Multifunctional Properties

A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography

A New Strategy of Lithography Based on Phase Separation of Polymer Blends

Scalable Nanofabrication of T-Shape Nanopillars Based on Polystyrene/Polyphenylsilsequioxane Films Showing Broadband Antireflection and Super-omniphobicity

Controlled thinning and surface smoothening of silicon nanopillars

Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography