A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application

Tianli Duan,Chenjie Gu,Diing Shenp Ang,Kang Xu,Zhihong Liu

DOI: https://doi.org/10.1039/d0ra09145f

IF: 4.036

2020-01-01

RSC Advances

Abstract:A novel technique is demonstrated for the fabrication of silicon nanopillar arrays with high aspect ratios.

chemistry, multidisciplinary

What problem does this paper attempt to address?

Fabrication of Submicrometer Inp Pillars by Colloidal Lithography and Dry Etching

Ming-Yu Li,Shagufta Naureen,Naeem Shahid,Srinivasan Anand

DOI: https://doi.org/10.1149/1.3464764

IF: 3.9

2010-01-01

Journal of The Electrochemical Society

Abstract:A simple method for the fabrication of submicrometer InP pillars with large surface area coverage has been developed based on a combination of colloidal lithography and inductively coupled plasma (ICP) etching technique using Cl(2)/H(2)/CH(4)/Ar chemistry. Pillars with different sizes could be fabricated by using colloidal SiO(2) particles with different sizes dispersed on the sample serving as masks. Pillars with lateral diameters as small as 60 nm and aspect ratios as high as 10: 1 have been obtained. The effects of etch parameters such as radio-frequency power, ICP power, and etching time on pillar fabrication are investigated. By a suitable choice of etch parameters and utilizing erosion of colloidal (mask) SiO(2) particle during etching, the height of the pillars as well as their shape can be modified from nearly cylindrical to conical shapes. Such a control on the shape of the structures in addition to the large surface coverage could be useful for applications in photovoltaics and for the fabrication of photonic crystals. For instance, continuous grading of the refractive index can be obtained for surfaces covered with conical pillars, which can be used as antireflecting surfaces in solar cells or for light extraction in light emitting diodes. (C) 2010 The Electrochemical Society. [DOI:10.1149/1.3464764] All rights reserved.
Optical Device Based on a Nanopillar Array by the Pattern Transfer of an Anodic Aluminum Oxide Membrane

Chenying Yang,Wen Mu,Chengang Ji,Zhen Wang,Huaxin Yuan,Kan Li,Xiaowen Zheng,Yueguang Zhang,Weidong Shen

DOI: https://doi.org/10.1021/acsami.9b10338

IF: 9.5

2019-01-01

ACS Applied Materials & Interfaces

Abstract:A simple and convenient nanofabrication method is proposed to achieve nanopillar arrays by the pattern transfer of an anodic aluminum oxide membrane, profiting from the rapid and efficient preparation process and regular hexagonal lattice patterns of the anodic aluminum oxide template. The taper angle of the nanopillar is affected by the distribution of the vapor particles during the deposition process, which is highly dependent on the material and deposition power. Based on this method, a novel scheme employing aluminum nanopillar arrays is demonstrated to realize the color tuning feature by simply varying the thickness of the top dielectric layer within a large range. The nanopillar arrays are completely covered by the thick dielectric layer atop due to the great conformality of the atomic layer deposition method that is used for the dielectric deposition. In addition, the color devices present good angular insensitivity up to 45°, resulting from the excited localized surface plasmon resonance within the metallic patches. The simple fabrication method is of great advantage to produce periodic nanostructures over large areas, which are widely used in designs and verifications of optical metasurfaces for various applications, including optical communication, imaging, sensing, and so forth.
Large-area Fabrication of Highly Reproducible Surface Enhanced Raman Substrate Via a Facile Double Sided Tape-Assisted Transfer Approach Using Hollow Au-Ag Alloy Nanourchins.

Zhen Liu,Lin Cheng,Lei Zhang,Chao Jing,Xin Shi,Zhongbo Yang,Yitao Long,Jixiang Fang

DOI: https://doi.org/10.1039/c3nr05840a

IF: 6.7

2014-01-01

Nanoscale

Abstract:A simple and facile double sided tape-assisted transfer method was exploited to fabricate surface enhanced Raman scattering (SERS) substrates with prominent uniformity and reproducibility.
Fabrication of ultrahigh-aspect-ratio and periodic silicon nanopillar arrays using dislocation lithography and deep reactive-ion etching

Zhibo Ma,Tongxin Guo,Shaolei Cheng,Zechen Song,Jiayan Wang,Weizheng Yuan

DOI: https://doi.org/10.1088/1361-6439/ab3749

2019-08-22

Journal of Micromechanics and Microengineering

Abstract:The aspect ratio of nanostructures determines the mechanical sensitivities and responses, such as hydrodynamic and oscillating flow detection. Nanopillar arrays with ultrahigh aspect ratio were fabricated using deep reactive-ion etching (DRIE) based on the optimized parameters in this study. Wafer-scale nanopatterning was achieved using dislocation lithography with normal photolithography machine instead of e-beam or EUVL. The wafer-scale Cr masks with 300, 500, and 700 nm line arrays were successfully patterned on silicon, providing etching mask for the fabrication of nanopillar arrays with a high aspect ratio. The important limitation of undercut during DRIE was solved by modifying the process parameters and using double masks composed of photoresist and Cr. Finally, the aspect ratio of the silicon nanopillar array reached 120 with smooth surface and vertical sidewalls. The methodology can provide a general approach for fabricating complex 3D periodic nanostructures that can be applied to various fields of multifunctional detection applications to increase detection probability and sensitivity.

engineering, electrical & electronic,nanoscience & nanotechnology,instruments & instrumentation,physics, applied
Controlled Fabrication Of Nanopillar Arrays As Active Substrates For Surface-Enhanced Raman Spectroscopy

Chuanmin Ruan,Gyula Eres,Wei Wang,Zhenyu Zhang,Baohua Gu

DOI: https://doi.org/10.1021/la0636356

IF: 3.9

2007-01-01

Langmuir

Abstract:Highly ordered gold nanopillar arrays were fabricated using anodized aluminum oxide (AAO) templates. Nanopillars with a dimension of 110 +/- 15 nm in vertical height and 75 +/- 10 nm in base diameter were formed with a density of 150 mu m(-2). The ordered nanopillar arrays give reproducible surface-enhanced Raman scattering (SERS) at a detection limit of 10(-8) M using thionine as probing molecules. The enhancement by the Au nanopillar arrays was comparable with or better than that of dispersed gold nanoparticle SERS substrates. This work demonstrates a new technique for producing highly ordered and reproducible SERS substrates potentially applicable for chemical and biological assay.
Fabrication of High-Aspect-ratio Silicon Nanopillar Arrays with the Conventional Reactive Ion Etching Technique

Y.-F. Chang,Q.-R. Chou,J.-Y. Lin,C.-H. Lee

DOI: https://doi.org/10.1007/s00339-006-3748-0

2006-01-01

Abstract:We fabricate silicon nanopillar arrays with pillar diameters smaller than 200 nm by using the conventional reactive ion etching (RIE) technique and nickel masks. We use the ratio between the lateral and vertical etching rates as an estimate of the etching anisotropy. The dependence of this ratio on the rf power, the chamber pressure, and the gas mixture is investigated systematically to achieve the largest etching anisotropy. Using the optimized etching parameters in the RIE process, we demonstrate silicon pillars with smooth surface, vertical sidewalls, and aspect ratios higher than 20. In addition, we employ dilute aqua regia to treat the pillars and shrink the diameters to 70 nm. The pillar height remains ∼2500 nm after the treatment.
Wafer Scale Fabrication of Dense and High Aspect Ratio Sub-50 Nm Nanopillars from Phase Separation of Cross-Linkable Polysiloxane/Polystyrene Blend

Yang Li,Yuli Hao,Chunyu Huang,Xingyao Chen,Xinyu Chen,Yushuang Cui,Changsheng Yuan,Kai Qiu,Haixiong Ge,Yanfeng Chen

DOI: https://doi.org/10.1021/acsami.7b00106

IF: 9.5

2017-01-01

ACS Applied Materials & Interfaces

Abstract:We demonstrated a simple and effective approach to fabricate dense and high aspect ratio sub-50 nm pillars based on phase separation of a polymer blend composed of a cross-linkable polysiloxane and polystyrene (PS). In order to obtain the phase-separated domains with nanoscale size, a liquid prepolymer of cross-linkable polysiloxane was employed as one moiety for increasing the miscibility of the polymer blend. After phase separation via spin-coating, the dispersed domains of liquid polysiloxane with sub-50 nm size could be solidified by UV exposure. The solidified polysiloxane domains took the role of etching mask for formation of high aspect ratio nanopillars by O-2 reactive ion etching (RIE). The aspect ratio of the nanopillars could be further amplified by introduction of a polymer transfer layer underneath the polymer blend film. The effects of spin speeds, the weight ratio of the polysiloxane/PS blend, and the concentration of polysiloxane/PS blend in toluene on the characters of the nanopillars were investigated. The gold-coated nanopillar arrays exhibited a high Raman scattering enhancement factor in the range of 10(8)-10(9) with high uniformity across over the wafer scale sample. A superhydrophobic surface could be realized by coating a self-assembled monolayers (SAM) of fluoroalkyltrichlorosilane on the nanopillar arrays. Sub-50 nm silicon nanowires (SiNWs) with high aspect ratio of about 1000 were achieved by using the nanopillars as etching mask through a metal-assisted chemical etching process. They showed an ultralow reflectance of approximately 0.1% for wavelengths ranging from 200 to 800 nm.
Hybrid micro/nano-structure formation by angular laser texturing of Si surface for surface enhanced Raman scattering.

Kaichen Xu,Chentao Zhang,Rui Zhou,Rong Ji,Minghui Hong

DOI: https://doi.org/10.1364/OE.24.010352

IF: 3.8

2016-01-01

Optics Express

Abstract:Surface enhanced Raman spectroscopy (SERS) has drawn much research interest in the past decades as an efficient technique to detect low-concentration molecules. Among many technologies, which can be used to fabricate SERS substrates, laser ablation is a simple and high-speed method to produce large-area SERS substrates. This work investigates the angular texturing effect by dynamic laser ablation and its influence on SERS signals. By tuning the angle between the Si surface and laser irradiation, the distributions and sizes of laser induced hybrid micro/nano-structures are studied. By decorating with a silver film, plenty of hot spots can be created among these structures for SERS. It is found that when the incident laser angle is 15 degrees at the laser fluence of 16.0 J/cm(2), the SERS performance is well optimized. This work realizes antisymmetric distribution of nanoparticles deposited on Si surface, which provides a flexible tuning of the hybrid micro/nano-structures' fabrication with high controllability for practical applications. (C) 2016 Optical Society of America
Hybrid Metal-Insulator-metal Structures on Si Nanowires Array for Surface Enhanced Raman Scattering

Kaichen Xu,Chentao Zhang,Tzu Hsiao Lu,Puqun Wang,Rui Zhou,Rong Ji,Minghui Hong

DOI: https://doi.org/10.3969/j.issn.1003-501x.2017.02.006

2017-01-01

Abstract:Surface enhanced Raman scattering（SERS）is an efficient technique to detect low concentration molecules.In this work,periodical silicon nanowires（Si NWs）integrated with metal-insulator-metal（MIM）layers are employed as SERS substrates.Laser interference lithography（LIL）combined with reactive ion etching（RIE）is used to fabricate large-area periodic nanostructures,followed by decorating the MIM layers.Compared to MIM disks array on Si surface,the SERS enhancement factor（EF）of the MIM structures on the Si NWs array can be increased up to 5 times,which is attributed to the enhanced electric field at the boundary of the MIM disks.Furthermore,high density of nanoparticles and nanogaps serving as hot spots on sidewall surfaces also contribute to the enhanced SERS signals.Via changing the thickness of the insulator layer,the plasmonic resonance can be tuned,which provides a new localized surface plasmon resonance（LSPR）characteristic for SERS applications.
Fabrication of Directional Nanopillars with High-Aspect-Ratio Using A Stretching Imprint Process with A Microcavity Mold

Weitao Jiang,Biao Lei,Hongzhong Liu,Dong Niu,Tingting Zhao,Bangdao Chen,Lei Yin,Yongsheng Shi,Xiaokang Liu

DOI: https://doi.org/10.1039/c6nr06957f

IF: 6.7

2017-01-01

Nanoscale

Abstract:Directional nanopillars with high-aspect-ratio have wide applications in home or industrial appliances and biomimetic robots. Their fabrication, however, is a challenge for conventional methods. In this study, we propose a simple stretching imprint process to prepare controllable directional (30°-90° in a slanted angle) nanopillars (200-800 nm in diameter) with high aspect ratio (>30) using a microcavity mold, beyond the conventional nanoimprint process, for 1 : 1 pattern transfer from the mold to the replica. The mechanism of the stretching imprint process is further investigated, and a rheology model for the filament evolution during the stretching process is established, which clearly shows that the aspect-ratio, diameter in submicrons, slanted angle, and also the tip profile of the free-standing nanopillars can be easily controlled by the imprint process using a microcavity mold. Further experiments indicate that the fabricated directional free-standing nanopillars show strong friction anisotropy, which may find applications in biomimetic studies.
Fabrication and Characterization of SiO2/Si Heterogeneous Nanopillar Arrays

Wengang Wu,Haiyang Mao,Xiang Han,Jun Xu,Weibing Wang

DOI: https://doi.org/10.1088/0957-4484/27/30/305301

IF: 3.5

2016-01-01

Nanotechnology

Abstract:This work presents arrays of heterogeneous nanopillars stacked with Si bodies and SiO2 heads for biomedical applications. Novel crossed and overlapped spacer techniques are proposed to fabricate the nanopillar arrays in controllable dimensions. For the nanopillars in the arrays, the minimum spacing, body diameter and head tip-radius reach 100 nm, 23 nm and 11 nm, respectively. The maximum height is 1.2 μm. In addition, because of hydrophilic/hydrophobic selectivity between the SiO2 heads and Si bodies, localized nanoliter water-droplet condensing, fluorescein solution extraction and protein capturing are observed on the SiO2 pillar heads. These experiments demonstrate the great potential of heterogeneous nanopillars in biomedical applications.
The Fabrication of High-Aspect-ratio, Size-Tunable Nanopore Arrays by Modified Nanosphere Lithography.

X. Chen,X. Wei,K. Jiang

DOI: https://doi.org/10.1088/0957-4484/20/42/425605

IF: 3.5

2009-01-01

Nanotechnology

Abstract:A modified nanosphere lithographic process for producing high aspect ratio and size-tunable nanopore arrays is described. A self-assembled bilayer nanosphere template is created as an etch mask for a deep reactive ion etching (DRIE) process. The size of the nanopores is tuned by reducing the diameter of the top-layer nanospheres using oxygen etching. Nanopore arrays with mean in-plane widths ranging from 120.9 to 343 nm and depths up to 2 microm have been achieved. This process offers excellent control over the nanopore size, aspect ratio and pitch of the fabricated nanostructures. The approach can also be extended to fabricate nanopore arrays of a wide range of materials.
Design and Fabrication of Large-Enhancement-Factor, Large-Area SERS Nanostructures

S. Chou,Wen‐Di Li,Fei Ding,J. Hu,Weihua Zhang,Yuxuan Wang,Liangcheng Zhou,Hao Chen,W. Ding

2012-01-01

Abstract:Abstract : Princeton University has carried out research to investigate the physics of surface-enhanced Raman scattering (SERS), develop new nanostructure designs to control and increase SERS sensitivity, and to use innovative high-precision large-area nanopatterning technologies to fabricate SERS nanostructures. Particularly, the research has led to (i) a new SERS substrate architecture, disk-coupled dots-on-pillar antenna-array (D2PA), that has a large-area uniform SERS enhancements of several orders of magnitude higher than the highest previously reported, (ii) new nanofabrication technologies for making such SERS substrate over large area with high throughput and low cost; (iii) giant fluorescence enhancement on such substrates, and (iv) applications of such substrates for bio/chemical detections.
Self-masked high-aspect-ratio polymer nanopillars.

Ming-Hung Chen,Yun-Ju Chuang,Fan-Gang Tseng

DOI: https://doi.org/10.1088/0957-4484/19/50/505301

IF: 3.5

2008-01-01

Nanotechnology

Abstract:In this paper, a simple, cost effective, and potentially universal method is proposed for the formation of high-aspect-ratio nanopillars on various polymers. Our method involves direct reactive ion etching (RIE) using self-formed nanomasks oriented from a dummy material (cover glass). The mechanism is evaluated using nanopillar characterization and surface analysis results from x-ray photoelectron microscopy (XPS) and Auger electron microscopy (AES). By varying the dummy material configuration and modifying the RIE etching time, the distribution and dimensions of the nanopillars can be manipulated to meet a range of requirements. The maximum structural aspect ratio of 60 (6.7 mu m high and 112 nm thick nanopillars) can be easily prepared using a 60 min self-masked high-aspect-ratio polymer nanopillars fabrication (SMHAR) process on poly(monochloro-p-xylylene) (Parylene C). Furthermore, nanopillars can also be generated using the same SMHAR process on poly(dimethylsiloxane) (PDMS) and SU-8 photoresist, creating nanostructured PDMS or SU-8 materials in lab-on-a-chip (LOC) or nano/micro-electromechanical systems (N/MEMS).
Fabrication and Characterization of Slanted Nanopillars Array

Y Fu,NKA Bryan

DOI: https://doi.org/10.1116/1.1926291

2005-01-01

Abstract:A nanopillars array for the application of molecular controlling was fabricated by use of focused ion-beam (FIB) fine milling on a substrate of silicon. The nanopillars array can realize cell/molecular adhesion and movement control by the arrays high-density contact dots and tiled cone angle of the pillars. This can be obtained using FIB with two methods. One is direct fine milling with bitmap function, and the other is zero-overlap scanning in both directions of horizontal and vertical alternatively with a stage in a certain tilted angle. The milling process was investigated under different beam current and the stage-tilting angles, which determines an aspect ratio and the inclined angle of the pillars. In order to characterize the nanopillars array, we made a replica of the nanopillars array by aid of nanoimprinting with poly(dimethylsiloxane) (PDMS), and measured the replica by atomic force microscope (AFM). The pillars array can be used as a molecular manipulator to cause cell/molecular motion forward in only one direction. This motion cannot be backward. It will also be helpful for cell/molecular analysis, such as molecule separation and purification, molecular detection, DNA hybridization, etc.
Au nanoparticle arrays with tunable particle gaps by template-assisted electroless deposition for high performance surface-enhanced Raman scattering.

Cheng Mu,Jian-Ping Zhang,Dongsheng Xu

DOI: https://doi.org/10.1088/0957-4484/21/1/015604

IF: 3.5

2010-01-01

Nanotechnology

Abstract:Surface-enhanced Raman spectroscopy (SERS) with enormous enhancements has shown great potential in ultrasensitive detection technologies, but the fabrication of large-scale, controllable and reproducible substrates with high SERS activity is a major challenge. Here, we report the preparation of Au nanoparticle arrays for SERS-active substrates with tunable particle sizes and interparticle gaps, and the enhancement factor of the SERS signal obtained from 4-mercaptopyridine probe molecules was as high as 10(7). The experimental data points show the increase of enhancement factor as a function of the ratio of diameter to interparticle gap, which can be explained by the averaged electromagnetic field enhancement model. Furthermore, we demonstrated that this type of substrate merits its high uniformity, high reproducibility and excellent long-term stability. As the fabrication protocol of such a SERS substrate is simple and inexpensive, this substrate may anticipate a wide range of applications in SERS-based sensors.
Monolithic Integrations of Slanted Silicon Nanostructures on 3D Microstructures and Their Application to Surface Enhanced Raman Spectroscopy

Zhida Xu,Logan Liu

DOI: https://doi.org/10.48550/arXiv.1402.1739

2014-02-07

Mesoscale and Nanoscale Physics

Abstract:We demonstrated fabrication of black silicon with slanted nanocone array on both planar and 3D micro and meso scale structures produced by a high-throughput lithography-free oblique-angle plasma etching process. Nanocones with gradual change in height were created on the same piece of silicon. The relation between the slanted angle of nanocones and incident angle of directional plasma is experimentally investigated. In order to demonstrate the monolithic integration of nanostructures on micro and meso scale non-planar surfaces, nanocone forest is fabricated on non-planar silicon surfaces in various morphologies such as silicon atomic force microscopy (AFM) tips and pyramidal pits. By integrating nanocones on inverse silicon micro-pyramid array devices, we further improved the surface enhanced Raman scattering (SERS) enhancement property of this optimized commercial SERS substrate by several folds even when using 66% less noble metal coating. We investigated the length gradient dependence and asymmetric properties of SERS effects for slanted nanocone with polarized excitation. This versatile and angle-controllable nanocone fabrication and monolithic 3D nano-micro-meso integration method provides new dimensions for production and optimization of SERS and other nanophotonic sensors.
Silicon Nanopillar-Forest Based Microfluidic Surface-Enhanced Raman Scattering Devices

H. Y. Mao,W. G. Wu,Y. L. Zhang,P. P. Lv,C. Qian,J. Xu,H. X. Zhang

DOI: https://doi.org/10.1109/MEMSYS.2011.5734588

2011-01-01

Abstract:We report a novel microfluidic surface-enhanced Raman scattering (SERS) device, which is achieved by bonding a polydimethylsiloxane cap with a microchannel structure onto an SERS-active substrate composed of noble-metal covered silicon nanopillar forests. The silicon nanopillar forests are fabricated by using nanomaterial dots, which are introduced in oxygen-plasma bombardment of photoresist, as etching masks. Analytes are uniformly distributed in the nanopillar forests by flowing through the microchannels, and thus higher measurement repeatability is obtained compared with regular open SERS-active substrates. Moreover, the enhancement factor (EF) of the devices can be self-calibrated by utilizing the flat metal areas beside the forests as references. Accordingly, such SERS devices have an EF on the order of 5.2x10(5). Meanwhile, the devices can reduce the measurement time from several hours to about 10 minutes.
High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Z. Shi,K. Jefimovs,M. Stampanoni,L. Romano

DOI: https://doi.org/10.48550/arXiv.2209.13672

2022-08-31

Abstract:Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to macroscale feature dimensions, is essential for producing functional interfaces for many applications. Arrays of silicon 3D nanostructures are needed to realize photonic and phononic crystals, waveguides, metalenses, X-ray wavefront sensors, detectors, microstructures and arrays of Si pillars are used as bio-interfaces in neural activity recording, cell culture, microfluidics, sensing and on-chip manipulation. Here, we present a new strategy for realizing arrays of protruding sharp Si nanopillars using displacement Talbot lithography combined with metal-assisted chemical etching (MacEtch) in gas phase. With the double exposure of a linear grating mask in orthogonal orientations and the lift-off technique, we realized a catalyst pattern of holes in a Pt thin film with a period of 1 {\mu}m and hole diameter in the range of 100-250 nm. MacEtch in gas phase by using vapor HF and oxygen from air allows to etch arrays of protruding Si nanopillars 200 nm-thick and aspect ratio in the range of 200 (pillar height/width) with an etching rate up to 1 {\mu}m/min. With the advantage of no stiction, no ion beam damage of the Si substrate, nanometric resolution and high fidelity of pattern transfer the method is an easy-to-scale-up processing that can support the fabrication of Si pillars arrays for many valuable applications both at micro and nano-scale.

Applied Physics,Optics
Gold Nanopillar Arrays As Biosensors Fabricated by Electron Beam Lithography Combined with Electroplating

Jianpeng Liu,Sichao Zhang,Yaqi Ma,Jinhai Shao,Bingrui Lu,Yifang Chen

DOI: https://doi.org/10.1364/ao.54.002537

IF: 1.9

2015-01-01

Applied Optics

Abstract:We report our work on the development of subwavelength gold pillar arrays as local surface plasmonic (LSP) resonators for sensor applications. These arrays are fabricated by electron beam lithography combined with electroplating. The conical shape, instead of flat one, on the top of Au pillars, induced by uneven current density in the plating, may affect the LSP resonance (LSPR). This paper aims to carry out a systematic study of LSPR behavior in nanopillar arrays with both flat and conical shapes on the top, trying to prove the feasibility of the developed nanoprocess. Both numerical simulations by the finite-difference time-domain (FDTD) method and experimental characterization on fabricated LSP resonators for reflectance spectra were carried out. Our experiments indicate that the fabricated nanopillar arrays in Au demonstrate the promising capability of refractive index sensing with sensitivity of 270 nm/refractive index unit. FDTD simulation of electric field density in the gap between pillars reveals the correlation between the resonant absorption of the incident light and the standing waves of localized surface plasmon polaritons in the gaps of the pillar array, despite the conical shape of the pillars. Moreover, it was discovered that the resonant absorption becomes stronger when the light incident angle is increased. The proposed nanoprocess for pillar arrays should possess great prospects for manufacturing Au pillars with high aspect ratio for achieving higher sensitivity at an economical cost.

A novel fabrication technique for high-aspect-ratio nanopillar arrays for SERS application

Fabrication of Submicrometer Inp Pillars by Colloidal Lithography and Dry Etching

Optical Device Based on a Nanopillar Array by the Pattern Transfer of an Anodic Aluminum Oxide Membrane

Large-area Fabrication of Highly Reproducible Surface Enhanced Raman Substrate Via a Facile Double Sided Tape-Assisted Transfer Approach Using Hollow Au-Ag Alloy Nanourchins.

Fabrication of ultrahigh-aspect-ratio and periodic silicon nanopillar arrays using dislocation lithography and deep reactive-ion etching

Controlled Fabrication Of Nanopillar Arrays As Active Substrates For Surface-Enhanced Raman Spectroscopy

Fabrication of High-Aspect-ratio Silicon Nanopillar Arrays with the Conventional Reactive Ion Etching Technique

Wafer Scale Fabrication of Dense and High Aspect Ratio Sub-50 Nm Nanopillars from Phase Separation of Cross-Linkable Polysiloxane/Polystyrene Blend

Hybrid micro/nano-structure formation by angular laser texturing of Si surface for surface enhanced Raman scattering.

Hybrid Metal-Insulator-metal Structures on Si Nanowires Array for Surface Enhanced Raman Scattering

Fabrication of Directional Nanopillars with High-Aspect-Ratio Using A Stretching Imprint Process with A Microcavity Mold

Fabrication and Characterization of SiO2/Si Heterogeneous Nanopillar Arrays

The Fabrication of High-Aspect-ratio, Size-Tunable Nanopore Arrays by Modified Nanosphere Lithography.

Design and Fabrication of Large-Enhancement-Factor, Large-Area SERS Nanostructures

Self-masked high-aspect-ratio polymer nanopillars.

Fabrication and Characterization of Slanted Nanopillars Array

Au nanoparticle arrays with tunable particle gaps by template-assisted electroless deposition for high performance surface-enhanced Raman scattering.

Monolithic Integrations of Slanted Silicon Nanostructures on 3D Microstructures and Their Application to Surface Enhanced Raman Spectroscopy

Silicon Nanopillar-Forest Based Microfluidic Surface-Enhanced Raman Scattering Devices

High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Gold Nanopillar Arrays As Biosensors Fabricated by Electron Beam Lithography Combined with Electroplating