Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Fabrication of large-scale periodic silicon nanopillar arrays for 2D nanomold using modified nanosphere lithography☆

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Size and Morphology Control of Highly-Ordered Nano-Silicon Pillar Fabricated by Direct Nanosphere Lithography

FABRICATION OF SILICON NANOARRAYS BY DIRECT NANOSPHERE LITHOGRAPHY

Fabrication of Submicrometer Inp Pillars by Colloidal Lithography and Dry Etching

Fabrication of Silicon Hierarchical Nanopillar Arrays Based on Nanosphere Lithography

Controllable Fabrication of Pyramidal Silicon Nanopore Arrays and Nanoslits for Nanostencil Lithography

Fabrication of ultrahigh-aspect-ratio and periodic silicon nanopillar arrays using dislocation lithography and deep reactive-ion etching

Fabrication of ordered arrays of silicon nanopillars in silicon-on-insulator wafers

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fabrication of Nanopillars Based on Silicon Oxide Nanopatterns Synthesized in Oxygen Plasma Removal of Photoresist

Fabrication of dual patterned nanocavities using double layer nanosphere lithography

Fabrication of Ordered Arrays of Silicon Nanopillars at Selected Sites

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of 2D silicon nano-mold by side etch lift-off method

A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography

Unconventional Lithography for Patterned Nanomaterials

Wafer Scale Fabrication of Dense and High Aspect Ratio Sub-50 Nm Nanopillars from Phase Separation of Cross-Linkable Polysiloxane/Polystyrene Blend

High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography