Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Study on Silicon Sieve Holes Array for Future Lithography Application

Fabrication of Silicon Nanopore Arrays with Three-Step Wet Etching

Wafer-Scale Fabrication of V-Shaped Silicon Nano-Slit Arrays

Fabrication Of Inverted-Pyramid Silicon Nanopore Arrays With Three-Step Wet Etching

Fabrication of Silicon Nanopore Arrays Using A Combination of Dry and Wet Etching

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

High Anodic-Voltage Focusing of Charge Carriers in Silicon Enables the Etching of Regularly-Arranged Submicrometer Pores at High Density and High Aspect-Ratio

Electrochemically Etched Pore Array in Silicon with Large Spacing and High-Aspect-ratio

Achieving a sub-10 nm nanopore array in silicon by metal-assisted chemical etching and machine learning

Fabrication of Nanopore and Nanopore Arrays in Si Substrate by Wet Etching Method at Wafer Scale

Fabrication of nanopores and nanoslits with feature sizes down to 5 nm by wet etching method

Photo-electrochemical Etching of Macroporous Silicon Arrays Used in Silicon Microchannel Plates

Deep reactive ion etching of cylindrical nanopores in silicon for photonic crystals

A novel method to fabricate silicon nanopore arrays

UV-assisted nanoimprint lithography: the impact of the loading effect in silicon on nanoscale patterns of metalens

A process study of electron beam nano-lithography and deep etching with an ICP system

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching

Numerical study of aperture shape effects in deep cryogenic etching of silicon

Anisotropic wet etching in application of SOI-based nano-optoelectronic devices

Unconventional Lithography for Patterned Nanomaterials