Enhanced Electroluminescence from Nanoscale Silicon P+–n Junctions Made with an Anodic Aluminum Oxide Pattern

T. Hong,T. Chen,G. Z. Ran,J. Wen,Y. Z. Li,T. Dai,G. G. Qin
DOI: https://doi.org/10.1088/0957-4484/21/2/025301
IF: 3.5
2009-01-01
Nanotechnology
Abstract:An enhancement of the electroluminescence (EL) from nanoscale silicon p(+)-n junctions made with an anodic aluminum oxide (AAO) pattern was demonstrated. The nanoporous AAO pattern with a pore density of 1.4 x 10(10) cm(-2) and a pore diameter of 50 +/- 10 nm was fabricated by the two-step anodic oxidation method on a n-type silicon wafer. The nanoscale AAO patterned Si p(+)-n junctions achieved an EL enhancement factor up to about 5 compared to the unpatterned Si p(+)-n junctions. The enhancement may originate from a reduction of nonradiative recombination due to partial passivation of the Si surface by the AAO pattern and improvement of the light extraction due to surface nanotextures.
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