Improved electroluminescence from n-ZnO/AlN/p-GaN heterojunction light-emitting diodes

J. B. You,X. W. Zhang,S. G. Zhang,J. X. Wang,Z. G. Yin,H. R. Tan,W. J. Zhang,P. K. Chu,B. Cui,A. M. Wowchak,A. M. Dabiran,P. P. Chow
DOI: https://doi.org/10.1063/1.3430039
IF: 4
2010-05-17
Applied Physics Letters
Abstract:n-ZnO/p-GaN heterojunction light-emitting diodes with and without a sandwiched AlN layer were fabricated. The electroluminescence (EL) spectrum acquired from the n-ZnO/p-GaN displays broad emission at 650 nm originating from ZnO and weak emission at 440 nm from GaN, whereas the n-ZnO/AlN/p-GaN exhibits strong violet emission at 405 nm from ZnO without GaN emission. The EL intensity is greatly enhanced by inserting a thin AlN intermediate layer and it can be attributed to the suppressed formation of the GaOx interfacial layer and confinement effect rendered by the AlN potential barrier layer.
physics, applied
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