Fabrication and emission properties of a n-ZnO/p-GaN heterojunction light-emitting diode

Xin Zhou,Shulin Gu,Shunming Zhu,Jiandong Ye,Wei Liu,Songmin Liu,Liqun Hu,Youdou Zheng,Rong Zhang,Yi Shi
2006-01-01
Abstract:We report the fabrication and characterization of light-emitting diodes based on n-ZnO/p-GaN heterojunctions. The n-type ZnO epilayer is deposited by metalorganic chemical vapor deposition (MOCVD) on a MOCVD grown Mg-doped p-GaN layer to form a p-n heterojunction. During the etching process, the relation between the etching depth and the etching time is linear in a HF and NH4Cl solution of a certain ratio. The etching rates of the SiO2 and ZnO are well controlled, which are essential for device fabrication. The current-voltage relationship of this heterojunction shows a diode-like rectifying behavior. In contrast to previous reports, electroluminescence (EL) emissions are observed by the naked eye at room temperature from the n-ZnO/p-GaN heterojunction under forward- and reverse-bias. The origins of these EL emissions are discussed in comparison with the photoluminescence spectra.
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