Zno Light-Emitting Diode Grown By Plasma-Assisted Metal Organic Chemical Vapor Deposition (Vol 88, 173506 2006)

w z xu,z z ye,y j zeng,l p zhu,b h zhao,liming jiang,j g lu,h p he,s b zhang
DOI: https://doi.org/10.1063/1.2199588
IF: 4
2009-01-01
Applied Physics Letters
Abstract:We report a breakthrough in fabricating ZnO homojunction light-emitting diode by metal organic chemical vapor deposition. Using NO plasma, we are able to grow p-type ZnO thin films on n-type bulk ZnO substrates. The as-grown films on glass substrates show hole concentration of 10(16) - 10(17) cm(-3) and mobility of 1-10 cm(2) V-1 s(-1). Room-temperature photoluminescence spectra reveal nitrogen-related emissions. A typical ZnO homojunction shows rectifying behavior with a turn-on voltage of about 2.3 V. Electroluminescence at room temperature has been demonstrated with band-to-band emission at I=40 mA and defect-related emissions in the blue-yellow spectrum range. (c) 2006 American Institute of Physics.
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