Low-parasitic ESD Protection Strategy for RF ICs in 0.35μm CMOS Process

Wang Yuan,Jia Song,Chen Zhong-Jian,Ji Li-Jiu
DOI: https://doi.org/10.1088/1009-1963/15/10/018
2006-01-01
Abstract:A systemic and comprehensive ESD-induced parasitic model is presented in this paper, which is used to analyse the parasitic influences of electrostatic discharge (ESD) protection circuits on the performance of radio frequency applications. A novel low-parasitic ESD protection structure is made in a 0.35 mu m 1P3M silicide CMOS process. The measured results show that this novel structure has a low parasitic capacitance about 310fF and a low leakage current about 12.2nA with a suitable ESD robustness target about 5kV human body model.
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