A Study of Accurate Extraction of ESD Parasitic Capacitance

Chenkun Wang,Fei Lu,Rui Ma,Qi Chen,Feilong Zhang,Cheng Li,Yuhua Cheng,Tianshen Tang,Albert Wang
DOI: https://doi.org/10.1109/icsict.2016.7998944
2016-01-01
Abstract:On-chip electrostatic discharge (ESD) protection are required for all ICs. Unfortunately, ESD-induced parasitic capacitance (C ESD ) will seriously affect performance of high-speed and RF ICs. Careful design balance of ESD protection level and minimizing ESD-induced circuit performance degradation has become a major design challenge for high-speed and RF ICs. This paper presents a comprehensive study on accurate extraction of parasitic capacitance for on-chip ESD structures. A new simple and accurate CESD-extraction technique is presented for practical IC designs, which was validated using RF, ring oscillator and I/O buffer circuit blocks implemented in a foundry 28nm CMOS technology.
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