Laser microstructuring of Si surfaces for low-threshold field-electron emission
V. Zorba,I. Alexandrou,I. Zergioti,A. Manousaki,C. Ducati,A. Neumeister,C. Fotakis,G.A.J. Amaratunga
DOI: https://doi.org/10.1016/j.tsf.2003.11.144
IF: 2.1
2004-01-01
Thin Solid Films
Abstract:Dense arrays of high aspect ratio Si micro-pyramids have been formed by cumulative high intensity laser irradiation of doped Si wafers in an SF6 environment. A comparative study using nanosecond (XeCl, 308 nm) and femtosecond (Ti: Sapphire, 800 nm and KrF, 248 nm) laser pulses has been performed in this work. The influence of pulse duration and ambient gas pressure (SF6) is also presented. Scanning electron microscopy has shown that upon laser irradiation conical features appear on the Si surface in a rather homogenous distribution and with a spontaneous self alignment into arrays. Their lowest tip diameter is 800 nm; while their height reaches up to 90 μm. Secondary tip decoration appears on the surface of the formed spikes. Areas of 2×2 mm2 covered with Si cones have been tested as cold cathode field emitters. After several conditioning cycles, the field emission threshold for the studied Si tips is as low as 2 V/μm, with an emission current of 10−3 A/cm2 at 4 V/μm. Even though these structures have smaller aspect ratios than good quality carbon nanotubes, their field emission properties are similar. The simple and direct formation of field emission Si arrays over small pre-selected areas by laser irradiation could lead to a novel approach for the development of electron sources.