Abstract:The preparation and characteristics of silicon nanoarrays is now an attractive areas of research. At present,most research focused on the optical and electrical properties and applications,and less field emission characteristics,as a mature technology of silicon planar support, silicon field emission cathode materials are easily compatible with the microelectronic integrated circuits, and so they have a broad application prospects.We present the fabrication of large-scale two dimensional periodic silicon nanoarrays using nanosphere lithography,and the field emission characteristics have been studied. The fabrication process includes following steps: first the crystalline silicon substrate was coated with a monolayer of self polystyrene (PS) spheres of 220 nm in diameter, then the sample was etched by reactive ion etching to produce silicon nanoarrays. AFM images of the nanoarrays show that the tips stand 60～70 nm high and the area density can achieve 6×109/cm2. All field emission measurements were performed at a vacuum of 1.0×10-4 Pa or better. Expected to improve the field emission characteristics, about 60 nm thickness of a amorphous carbon film was deposited on top of the silicon nanoarrays by plasma-enhanced chemical vapour deposition. Field emission results show that compared to silicon nanoarrays, silicon nanoarrays coated with a thin a-C film effectively lower the threshold fields, approximately 8.1 V/μm, while field enhancement factor increased. When the electric field intensity reached 20 V/μm, the current density can reach about 1.4 mA/cm2. The improvement of field emission originates from the anisotropic structure of the films,when conductive sp2 clusters embedded in an insulating sp3 matrix,the electric field has been enhanced.

Enhancing Electron Emission From Silicon Tip Arrays By Using Thin Amorphous Diamond Coating

Comparative Study of Electron Emission Characteristics of Silicon Tip Arrays with and Without Amorphous Diamond Coating

Silicon Tip Arrays with Ultrathin Amorphous Diamond Apexes

Field emission from amorphous diamond coated silicon tips

Narrow Energy Spread Electron Emission from Si-Tip with Ultra-Thin Diamond Like Carbon Coating

Effects of the Surface Treatment of Silicon Substrate on the Field Emission Characteristic of A Silicon and Amorphous Diamond Cold Cathode Emitter

Electron emission from nanostructures

Field electron emission from ultra-high density Si nanotip arrays

Microfabrication and Characterization of Gated Amorphous Diamond-Based Field Emission Electron Sources.

Modeling of the Electron Field Emission Process in Polycrystalline Diamond and Diamond-Like Carbon Thin Films

Laser microstructuring of Si surfaces for low-threshold field-electron emission

Modelling of the Electron Field Emission Process in Polycrystalline Diamond-Like Carbon Thin Films

Electron Field Emission Characteristics from Single-crystal Silicon Nanoarrays Fabricated by Direct Lithography with Nanosphere Mask

Field Electron Emission of Si Nanotips with Apexes of Various Compositions

Electron Field Emission Studies from Amorphous Carbon Thin Films

Microstructural Modification of Diamond-Graphite Nanohybrid Films Via Adjusting Deposition Temperatures for Enhanced Electron Field Emission

High Performance Field Emission Cathode based on the Diamond Nanowires Prepared by Nanocrystalline Diamond Films Annealed in Air

Si-Tips with Saturated High Concentration Arsenic Dopant at the Nano-Apexes for Uniform Field Electron Emission

Experimental Evidence of Resonant Field Emission from Ultrathin Amorphous Diamond Thin Film

Nanostructured Diamond Film on Etched Silicon and Its Field Emission Behavior

Preparation and Characterization for Nanodiamond Thin Film for Electronic Field Emission Applications