Abstract:The microstructural properties of nitrogenated hydrogenated amorphous carbon (a-C:H:N) thin films deposited using a chemical vapour deposition system are analysed in order to evaluate their impact on the opto-electronic properties. Electron energy loss spectroscopy is used to reconstruct a joint density of states (JDOS) for the a:C:H:N films and thus used to examine the microstructure, Information obtained from optical absorption is then used to confirm the JDOS. Using this JDOS we attempt to predict the variation expected in the electronic conduction as a function of nitrogen content. The electrical data obtained for the a:C:H:N thin films appear to be bulk controlled as opposed to metal contact dominated for films that an deposited on the driven electrode and are more diamond-like in character. The bulk electronic properties at high fields an fitted to different types of conduction behaviour in order to obtain the best tits to the data, From this study it is observed that a Poole-Frenkel type fit is best for films chat have a diamond-like structure, For the films that have a polymeric structure which are deposited on the earthed electrode the conductivities are very much lower, and consistent with the lower defect densities observed in the microstructural study, It is possible that the conduction in these films are Schottky barrier controlled, (C) 1998 Elsevier Science S.A, All rights reserved.

Electron Field Emission Studies from Amorphous Carbon Thin Films

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Nitrogen Containing Hydrogenated Amorphous Carbon for Thin-Film Field Emission Cathodes

Field emission from a new form of thin film amorphous carbon having nanoparticle inclusions and carbon nanotubes

Electronic Behaviour and Field Emission of A-C:H:n/si Heterojunctions

Field emission from a-C:H and a-C:H:N

Field Emission from As Grown and Nitrogen Incorporated Tetrahedral Amorphous Carbon/Silicon Heterojunctions Grown Using A Pulsed Filtered Cathodic Vacuum Arc Technique

Self-texturing of nitrogenated amorphous carbon thin films for electron field emission

Electron Field Emission from Diamond-Like Carbon

Highly luminescent hydrogenated amorphous carbon (a-C:H) thin films

Nitrogenated Amorphous Carbon As a Semiconductor

The Performance of Thin Film Carbon Materials and Carbon Nanotubes As Cold Cathodes

A Study of Field Electron Emission from Thin Amorphous-Carbon-Nitride Films

Stable Field Emission with Low Threshold Field from Amorphous Carbon Films Due to Layer-by-layer Hydrogen Plasma Annealing

Structure and Luminescence Properties of an Amorphous Hydrogenated Carbon

Field Electron Emission from Carbon Containing Thin Films

The microstructural dependence of the opto-electronic properties of nitrogenated hydrogenated amorphous carbon thin films

Vacuum Electron Emission with Low Turn-On Electric Field from Hydrogenated Amorphous Carbon Thin Films

VERY LOW THRESHOLD ELECTRON FIELD EMISSION FROM AMORPHOUS CARBON FILMS WITH HYDROGEN DILUTION

Low Field-Induced Electron Emission Phenomenon Observed from the Carbon Containing Thin Films