Self-texturing of nitrogenated amorphous carbon thin films for electron field emission

S. R. P. Silva,Surrey GU,Gehan A. J. Amaratunga,J. R. Barnes

DOI: https://doi.org/10.1063/1.119975

IF: 4

2010-01-01

Applied Physics Letters

Abstract:The electron field-emission process for nitrogenated amorphous carbon (alpha-C:H:N) thin films deposited using a magnetically confined hydrocarbon plasma is examined. The morphology of the films obtained using an atomic force microscope is compared to the field-emission properties. Beyond a chemical composition of 14 at. % nitrogen, the mirror smooth alpha-C:H:N films become self-texturing, and multiple ''domelike'' cathodes of nanometer scale are observed. The dimensions of these ''domelike'' cathodes varies with time, and after a 15 min deposition have dimensions of approximately 50 nm base diameter and 20 nm in height. When the electronic field emission of these textured films (N content 15 at. %) are measured, there is an enhancement in the emitted current density of similar to 2 orders of magnitude at an electric field of 20 V/mu m, in comparison to the untextured films with a nitrogen content of 11 at. %. (C) 1997 American Institute of Physics.