Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

Investigation of carbon nitride films by cathodic arc evaporation

Optical & Electronic Properties of Carbon Nitride Thin Films

Ion-beam-assisted Deposition of CNx Films

Investigations on Structural Properties of Carbon Nitride Films Synthesized by Reactive Ionized Cluster Beam Deposition

Formation of Β-C3n4 Phase in C-N Films Deposited by Reactive Ionized Cluster Beam Method

Electron energy loss spectroscopy of amorphous carbon nitride

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Investigation of Carbon Nitride Films Deposited by Ion Beam-Assisted Deposition with Low Bombarding Energy of N Ions

Carbon Nitride Films Synthesized By Nh3-Ion-Beam-Assisted Deposition

Substitutional Nitrogen Doping of Tetrahedral Amorphous Carbon

Field Emission Properties of Nanocomposite Carbon Nitride Films

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

Preparation and Characterisation of Carbon Nitride Films Deposited by Pulsed Laser Arc Deposition

Structural And Tribological Characteristics Of Carbon Nitride Films Deposited By The Reactive Ionized-Cluster Beam Technique

Structure and properties of carbon nitride films synthesized by low energy ion bombardment

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Synthesis and Thermal Decomposition of Carbon Nitride Films Prepared by Nitrogen Ion Implantation into Graphite

X-ray diffraction analysis on the RF-CVD deposited carbon nitride films

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Experimental Studies of Superhard Materials Carbon Nitride Cnx Prepared by Ion-Beam Synthesis Method

Carbon nitride films synthesized by the reactive ionized cluster beam technique