Electron energy loss spectroscopy of amorphous carbon nitride

K.W.R. Gilkes,J. Yuan,G.A.J. Amaratunga
DOI: https://doi.org/10.1016/0925-9635(95)00365-7
IF: 3.806
1996-01-01
Diamond and Related Materials
Abstract:Electron energy loss spectroscopy (EELS) has been used to determine the C and N bonding states in two types of amorphous CN film produced using two different deposition methods. Although both types of film are found to possess a significant sp2-bonded component, this component is reduced in the films deposited by a filtered cathodic arc (FCA), leading to a higher film density. For films deposited using electron beam evaporation of graphite combined with an electron cyclotron resonance (ECR) plasma, inconsistencies between X-ray photoelectron spectroscopy (XPS) and EELS measurements of the N content suggest that N is concentrated near the film surface, indicating that the material possesses more than one structural phase. These results suggest that the FCA technique may be more suitable for producing densea-CxNy films in which N is homogeneously distributed throughout the film.
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