Abstract:Crystalline carbon nitride films have been synthesized on polycrystalline Ni substrates by a microwave plasma chemical vapour deposition technique, using a mixture of N2, CH4 and H2 as precursor. Scanning electron microscopy shows that the film consisted of perfect crystals of short and long hexagonal bars, tetragonal bars and irregular particles. From the X-ray photoelectron spectroscopy (XPS) data, a maximum N/C ratio of 1.0 was achieved in the films. The XPS spectra of the film typically showed three peaks in the C 1s core spectrum (centered at 284.78, 285.94, and 287.64 eV) and two peaks in the N 1s core level spectrum (centered at 398.35 and 400.01 eV). This indicates that there are two types of C–N bonds; N is bonded to sp2- or sp3-coordinated C atoms in the as-deposited film. The X-ray diffraction pattern indicates that the film is composed of α-, β-, pseudocubic, graphitic C3N4 and an unidentified phase. A series of intense sharp Raman peaks were observed in the range of 100–1500 cm−1. These peaks match well with the calculated Raman frequencies of α- and β-C3N4, revealing the formation of α- and β-C3N4 phase.

Formation of Β-C3n4 Phase in C-N Films Deposited by Reactive Ionized Cluster Beam Method

Investigations on Structural Properties of Carbon Nitride Films Synthesized by Reactive Ionized Cluster Beam Deposition

Investigation of carbon nitride films by cathodic arc evaporation

Carbon nitride films synthesized by the reactive ionized cluster beam technique

Carbon Nitride Films Synthesized By Nh3-Ion-Beam-Assisted Deposition

Carbon nitride films synthesized with an improved reactive ionized cluster beam system

Structure and tribological properties of carbon nitride films obtained by the reactive ionized cluster beam method

Crystalline Carbon Nitride Film Synthesized by Ion Beam Assisted Magnetron Sputtering and Thermal Annealing in Nitrogen Gas

Ion-beam-assisted Deposition of CNx Films

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Formation of Cubic C3N4 Thin Films by Plasma Enhanced Chemical Vapor Deposition

Structural And Tribological Characteristics Of Carbon Nitride Films Deposited By The Reactive Ionized-Cluster Beam Technique

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

Synthesis of C3N4+ by the Combination of Laser Ablation of Graphite and N2 Molecular Beam

Crystalline Carbon Nitride Films Prepared by Microwave Plasma Chemical Vapour Deposition

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Ion beam synthesis of C-N crystalline film and its analysis

Optical & Electronic Properties of Carbon Nitride Thin Films

Growth of CN Films by Reactive Ionized Cluster Beam Deposition