Abstract:Hydrogenated amorphous carbon films have many unique properties, they have attracted much attention because of their applications in many kinds of optoelectronic devices such as light emitting diodes and field emission devices. It was well known that the film structures and properties were varied in a wide range by changing many factors such as hydrogen content and treatment. In this paper, the influence of hydrogen dilution on the optical properties of a-C: H films was studied. The a-C: H films were prepared in a capacitance coupled plasma enhanced vapor chemical deposition system at 13. 56MHz. The gas mixture of CH4 and H2 was used as source and the flow rate of the H2 was changed. The structures and optical properties were investigated by Fourier-transform infrared spectra, photoluminescence spectra and optical absorption spectra. It was concluded that hydrogen dilution can, to some extent, etch the weak bonds in films, decrease the size of sp2 clusters, and increase the sp3 C-Hn con- tent which results in the increase of the optical band gap of a-C: H films. The optical band gap increased from 2. 57eV to 2. 72eV with increasing hydrogen dilution ratio. Consequently, the PL peak energy has a blue shift from 2. 5eV to 2. 75eV under the excitation with 3.54eV light. The further increase of the hy- drogen dilution will induce the change of the bonding configurations in the carbon films, which results in the multiple PL bands in the luminescence spectra at room temperature. The a-C: H films include both sp3 C-C, C-H and sp2 carbon related clusters. The C=C bonds can exist in the form of olefinic chains, six- fold ring aromatic species et al. Under different hydrogen dilution conditions, the main C= C structure in the sp2 clusters was different, which induces the different structures and optical properties of a-C:H films.

VERY LOW THRESHOLD ELECTRON FIELD EMISSION FROM AMORPHOUS CARBON FILMS WITH HYDROGEN DILUTION

Vacuum Electron Emission with Low Turn-On Electric Field from Hydrogenated Amorphous Carbon Thin Films

The Effect of Hydrogen Dilution on the Field Emission from Hydrogenated Amorphous Carbon Films

Electron Field Emission Studies from Amorphous Carbon Thin Films

Improvement of electron field emission from amorphous carbon films due to hydrogen plasma chemical annealing effect

Stable Field Emission with Low Threshold Field from Amorphous Carbon Films Due to Layer-by-layer Hydrogen Plasma Annealing

The effect of hydrogen plasma chemical annealing on electron field emission of amorphous carbon films

Green and Blue Light Emitting from Hydrogenated Amorphous Carbon Films Diluted by Hydrogen

The Effect of Relatively Low Hydrogen Dilution on the Properties of Carbon-Rich Hydrogenated Amorphous Silicon Carbide Films

The change of photoluminescence characteristics of amorphous carbon films due to hydrogen dilution

A Field Emission Study of the Critical Parameters of Amorphous Carbon Films Deposited on a Variety of Carbonaceous Substrates

Effect of Hydrogen Treatment on the Field Emission of Amorphous Carbon Film

Structure and Luminescence Properties of an Amorphous Hydrogenated Carbon

Effect of Nitrogen Surface Doping on the Work Function and Field Emission of Hydrogenated Amorphous Carbon Films

Nitrogen Containing Hydrogenated Amorphous Carbon for Thin-Film Field Emission Cathodes

Low Field-Induced Electron Emission Phenomenon Observed from the Carbon Containing Thin Films

Electron Field Emission from Diamond-Like Carbon

Field Emission from As Grown and Nitrogen Incorporated Tetrahedral Amorphous Carbon/Silicon Heterojunctions Grown Using A Pulsed Filtered Cathodic Vacuum Arc Technique

Properties of Tetrahedral Amorphous Carbon Films Deposited in a Filtered Cathodic Arc in the Presence of Hydrogen

A Study of Electroluminescence in Hydrogenated Amorphous-Carbon Films

Field emission from a new form of thin film amorphous carbon having nanoparticle inclusions and carbon nanotubes