Abstract:Hydrogenated amorphous carbon films have many unique properties, they have attracted much attention because of their applications in many kinds of optoelectronic devices such as light emitting diodes and field emission devices. It was well known that the film structures and properties were varied in a wide range by changing many factors such as hydrogen content and treatment. In this paper, the influence of hydrogen dilution on the optical properties of a-C: H films was studied. The a-C: H films were prepared in a capacitance coupled plasma enhanced vapor chemical deposition system at 13. 56MHz. The gas mixture of CH4 and H2 was used as source and the flow rate of the H2 was changed. The structures and optical properties were investigated by Fourier-transform infrared spectra, photoluminescence spectra and optical absorption spectra. It was concluded that hydrogen dilution can, to some extent, etch the weak bonds in films, decrease the size of sp2 clusters, and increase the sp3 C-Hn con- tent which results in the increase of the optical band gap of a-C: H films. The optical band gap increased from 2. 57eV to 2. 72eV with increasing hydrogen dilution ratio. Consequently, the PL peak energy has a blue shift from 2. 5eV to 2. 75eV under the excitation with 3.54eV light. The further increase of the hy- drogen dilution will induce the change of the bonding configurations in the carbon films, which results in the multiple PL bands in the luminescence spectra at room temperature. The a-C: H films include both sp3 C-C, C-H and sp2 carbon related clusters. The C=C bonds can exist in the form of olefinic chains, six- fold ring aromatic species et al. Under different hydrogen dilution conditions, the main C= C structure in the sp2 clusters was different, which induces the different structures and optical properties of a-C:H films.

Photoluminescence of Amorphous Carbon Films Fabricated by Layer-By-Layer Hydrogen Plasma Chemical Annealing Method

Preparation of Amorphous Carbon Films by Layer-By-Layerhydrogen Plasma Annealing Method and Their Luminescence Properties

The effect of hydrogen plasma chemical annealing on electron field emission of amorphous carbon films

Improvement of electron field emission from amorphous carbon films due to hydrogen plasma chemical annealing effect

Stable Field Emission with Low Threshold Field from Amorphous Carbon Films Due to Layer-by-layer Hydrogen Plasma Annealing

Microstructures and Photoluminescence of Hydrogenated Amorphous Carbon Films Produced by Using Organic Hydrocarbon Source

Fabrication of amorphous carbon films by using organic hydrocarbon source

Structure and Luminescence Properties of an Amorphous Hydrogenated Carbon

The change of photoluminescence characteristics of amorphous carbon films due to hydrogen dilution

Study on effect of hydrogen treatment on amorphous carbon film using scanning probe microscopy

Gas Barrier Properties of Amorphous Hydrogenated Carbon Films by Plasma -Enhanced CVD

Properties of Tetrahedral Amorphous Carbon Films Deposited in a Filtered Cathodic Arc in the Presence of Hydrogen

A Field Emission Study of the Critical Parameters of Amorphous Carbon Films Deposited on a Variety of Carbonaceous Substrates

Effect of Hydrogen Treatment on the Field Emission of Amorphous Carbon Film

Hydrogenated amorphous silicon-carbide thin films with high photo-sensitivity prepared by layer-by-layer hydrogen annealing technique

Novel Luminescence Properties of A-C:H Films Produced by Using an Organic Source at Various Substrate Temperatures

Novel photoluminescence from hydrogenated amorphous carbon films prepared by using xylene source

Highly luminescent hydrogenated amorphous carbon (a-C:H) thin films

VERY LOW THRESHOLD ELECTRON FIELD EMISSION FROM AMORPHOUS CARBON FILMS WITH HYDROGEN DILUTION

Bright Blue Photoluminescence from the Amorphous Carbon Via Surface Plasmon Enhancement

Green and Blue Light Emitting from Hydrogenated Amorphous Carbon Films Diluted by Hydrogen