Gas Barrier Properties of Amorphous Hydrogenated Carbon Films by Plasma -Enhanced CVD

张跃飞,张广秋,葛袁静,陈光良,王瑜
DOI: https://doi.org/10.3969/j.issn.1001-3563.2004.04.071
2004-01-01
Abstract:The thin amorphous hydrogenated carbon films were deposited on polyethylene terephthalate (PET) by means of capacitive coupled RF plasma-enhanced chemical vapor deposition (PECVD) using a mixture of CH4 and Ar gas as source. Chemical compositions and bonding of the deposited films were analyzed by fourier transform infrared spectroscopy(FTIR), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy(XPS), laser Roman spectroscopy(LRS) and atomic force microscopy(AFM). The barrier properties were examined by water vapor permeation according to National Standard of the People's Republic of China. The results show that the amorphous hydrogenated carbon film can be prepared on PET surface by plasma-enhanced chemical vapor deposition. The film thickness was from nm to μm and the films were composed of sp~2 and sp~3 hybridized hydrogenated carbon compounds. The barrier performance of PET coated by hydrogenated carbon film is improved obviously comparing with uncoated one.
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