High vapour barrier thin films deposited by R.F.-discarge plasma enhanced CVD

Yuefei Zhang,Qiang Chen,Yu Wang,Guangqiu Zhang,Yuanjing Ge
2006-01-01
Abstract:In this paper, a thin amorphous hydrogenated carbon films were deposited on polyethylene terephthalate (PET) by means of capacitive coupled RF plasma-enhanced chemical vapor deposition (PECVD) using a mixture of CH 4 with Ar gas as a source. The chemical composition of the deposited films were analyzed by fourier transform infrared (FT1R) spectroscopy, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), laser Roman spectroscopy(LRS). And the microgram of the film was detected by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The barrier properties were examined by water vapour permeation. The results show that the amorphous hydrogenated carbon film can be prepared on PET surface by plasma-enhanced chemical vapor deposition with thickness from nm to μm scale, in which sp2 and sp3 hybridized hydrogenated carbon composed the film. The barrier performance of water vapor permeation in PET coated by hydrogenated carbon film was decreased from 86.16 (g/m2d) to 10.68 ((g/m2d) in experiments.
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