Abstract:The microstructural properties of nitrogenated hydrogenated amorphous carbon (a-C:H:N) thin films deposited using a chemical vapour deposition system are analysed in order to evaluate their impact on the opto-electronic properties. Electron energy loss spectroscopy is used to reconstruct a joint density of states (JDOS) for the a:C:H:N films and thus used to examine the microstructure, Information obtained from optical absorption is then used to confirm the JDOS. Using this JDOS we attempt to predict the variation expected in the electronic conduction as a function of nitrogen content. The electrical data obtained for the a:C:H:N thin films appear to be bulk controlled as opposed to metal contact dominated for films that an deposited on the driven electrode and are more diamond-like in character. The bulk electronic properties at high fields an fitted to different types of conduction behaviour in order to obtain the best tits to the data, From this study it is observed that a Poole-Frenkel type fit is best for films chat have a diamond-like structure, For the films that have a polymeric structure which are deposited on the earthed electrode the conductivities are very much lower, and consistent with the lower defect densities observed in the microstructural study, It is possible that the conduction in these films are Schottky barrier controlled, (C) 1998 Elsevier Science S.A, All rights reserved.

Highly luminescent hydrogenated amorphous carbon (a-C:H) thin films

Structure and Luminescence Properties of an Amorphous Hydrogenated Carbon

Electron Field Emission Studies from Amorphous Carbon Thin Films

Photoluminescence in Hydrogenated Amorphous Carbon

Polarization Memory of Photoluminescence in Amorphous Carbon

Photoluminescence Behavior Of Hydrogenated Amorphous Carbon

The microstructural dependence of the opto-electronic properties of nitrogenated hydrogenated amorphous carbon thin films

Preparation of amorphous carbon films by layer-by-layer hydrogen plasma annealing method and their luminescence properties

Blue-green luminescence and SERS study of carbon-rich hydrogenated amorphous silicon carbide films with multiphase structure

Superlattice Structures Based on Amorphous Carbon

Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes

The Effect of Relatively Low Hydrogen Dilution on the Properties of Carbon-Rich Hydrogenated Amorphous Silicon Carbide Films

Novel Luminescence Properties of A-C:H Films Produced by Using an Organic Source at Various Substrate Temperatures

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Multiphase Structure of Hydrogenated Amorphous Silicon Carbide Thin Films

Structural Investigation And Barrier Properties Of A-C : H Thin Films On Polymer By Pecvd

A Field Emission Study of the Critical Parameters of Amorphous Carbon Films Deposited on a Variety of Carbonaceous Substrates

Enhanced Photoluminescence of Hydrogenated Amorphous Silicon Carbide Thin Films by Means of a Fast Thermal Annealing Process

Transparency, Wettability, and Tribological Properties of Amorphous Hydrogenated Carbon Films Deposited on PMMA by RF-PECVD

Microstructures and Photoluminescence of Hydrogenated Amorphous Carbon Films Produced by Using Organic Hydrocarbon Source

The Influence of Radio Frequency Power on the Characteristics of Carbon-Rich Hydrogenated Amorphous Silicon Carbide Films