Formation of Intermetallic Compounds by Zr and V Ion Implantation into Aluminum

苗伟,陶琨,李彬,柳百新
DOI: https://doi.org/10.3969/j.issn.1672-7126.2001.04.003
2001-01-01
Abstract:The intermetallic compounds of Al3Zr, Al10V and Al3V were directly prepared by ion implantation. The stable DO23-Al3Zr and metastable Ll2-Al3Zr phases were formed by implanting Zr ions into Al films with a current density of 64 μA/cm2, and a dose of 5×1017 ions/cm2. The Al10V and Al3V phases were grown by implanting V ions into Al films with a current density of 51 μA/cm2 and a dose of 3×1017 ions/cm2. The elastic modulus and hardness of the Al surface significantly increased after the Zr and V ion implantation.
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