Abstract:The interfacial reactions induced by vacuum furnace annealing and rapid thermal annealing in sequentially deposited Al/Ni bimetallic thin-film diffusion couples have been investigated with MeV 4He+ backscattering spectrometry, cross-sectional transmission electron microscopy, and Auger electron spectroscopy. Upon annealing, NiAl3 is the first aluminide phase to grow. In uncontaminated samples, the NiAl3 growth proceeds in uniform planar fashion, governed by diffusion-limited kinetics. The kinetics data fit well with those for NiAl3 growth on large-grained Al substrates, yielding a common kinetics law of x2=kt, where x is the thickness of the NiAl3 grown at the interface, t is the annealing duration, and k is the growth constant, which is given by k=2.24(cm2/s) exp(−1.5±0.1 eV/kBT), in which T is the annealing temperature and kB is the Boltzmann constant. Microscopic examination reveals slight nonuniformity at the Al/NiAl3 interface resulting from shallow local protrusions of NiAl3 grains into the Al layer at grain boundaries. When either the Al film or the Al/Ni interface is purposely contaminated during sample preparation, the roughness at this Al/NiAl3 interface becomes very pronounced, and the reaction rate is significantly reduced. Meanwhile, Ni motion becomes appreciable as NiAl3 grains and/or Ni severely penetrate the Al layer. In contrast, the NiAl3/Ni interface remains sharp in all samples. The irregular morphology and nonuniform reaction cannot be attributed uniquely to the presence of grain boundaries in the Al film, but rather are a combined effect of impurities and Al grain boundaries. Short-term rapid thermal annealing at elevated temperatures appreciably alleviates the nonuniformity at the Al/NiAl3 interface in contaminated samples.

Formation of NbAl3 by Nb Ion Implantation Using Metal Vapor Vacuum Arc Ion Source

Modification of Surface Mechanical Properties of Aluminum by Nb Ion Implantation

High current Ni-ion implantation into Al films

Formation of DO23-Al3Zr by Zr Ion Implantation Using a Metal Vapour Vacuum Arc Ion Source

Investigation on the Microstructure and Mechanical Behaviors of a Laser Formed Nb-Ti-Al Alloy

Formation of Al3Hf by Hf ion implantation into aluminum using a metal vapor vacuum arc ion source

Formation of Intermetallic Compounds by Zr and V Ion Implantation into Aluminum

Synthesis of Nb3Al high temperature intermetallic compound by laser deposition

High Current Ni- and Fe-ion Implantation into an Al Surface to Modify the Mechanical Properties

Study of Nb3Al Intermetallics Prepared by Laser Deposition

Modification of surface mechanical properties of aluminum by high current Mo ion implantation using a MEVVA ion source

The Reaction Process of NbAl Interface in Rod-in-Tube Strands

Preparation of Nb 3 Al Superconductor by Powder Metallurgy and Effect of Mechanical Alloying on the Phase Formation

Preparation of Nb3al by High-Energy Ball Milling and Superconductivity

Tribological Properties of Ti-Al-N Films Prepared by Plasma-Based Ion Implantation Mixing

Preparation of Nb3Al Powder by Chemical Reaction in Molten Salts

Control of Al Content During Ism Process of Nb3al

Surface Characteristics and Corrosion Behavior of Ti-4Al-2V Alloy Implanted with Al and Nb

Nial3 Formation in Al/Ni Thin-Film Bilayers with and Without Contamination

The effect of N+-implanted aluminum substrate on the mechanical properties of TiN films

Surface Characterization and Corrosion Resistance of Ti–Al–Zr Alloy by Niobium Ion Implantation