Electroluminescence from Au/Si Nitride Film/si with the Film Prepared by Electron Cyclotron Resonance Method

AP Li,LD Zhang,YX Zhang,GG Qin,X Wang,XW Hu
DOI: https://doi.org/10.1063/1.118115
IF: 4
1996-01-01
Applied Physics Letters
Abstract:We use only nitrogen as the reaction gas to deposit on the cleaned Si wafer an extra-thin Si nitride film (similar to 40 Angstrom) by electron cyclotron resonance method. Electroluminescence (EL) with its peak wavelength at about 7000 Angstrom from the semitransparent Au/extra-thin Si nitride film/p-Si structure has been detected. The effects of forward bias and annealing on the EL have been studied. (C) 1996 American Institute of Physics.
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