Electroluminescence from Si Nanocrystals by Annealing Amorphous Silicon Carbide Films

Yunjun Rui,Shuxin Li,Chao Song,Hongcheng Sun,Tao Lin,Yu Liu,Jun Xu,Wei Li,Kunji Chen
DOI: https://doi.org/10.1117/12.888225
2010-01-01
Abstract:In this work, a-SiC:H films have been fabricated in plasma enhanced chemical vapor deposition system by controlling the gas flux ratio R of methane to silane and subsequently annealed in N2 atmosphere for 1 h at the temperature of 1000°C. Raman spectra showed the formation of Si nanocrystals embedded in amorphous SiC matrix after annealing. Room temperature visible electroluminescence was achieved due to the recombination of electron-hole pairs in Si nanocrystals for the annealed samples. The current-voltage relationships were also investigated and the tunneling mechanism was discussed based on the carrier transport properties.
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