A novel internal field enhanced retention degradation model for localized charge trapping memory device

Xiao Yu,Liyang Pan,Fengying Qiao,Guangjian Shi,Jun Xu
DOI: https://doi.org/10.1109/IPFA.2012.6306295
2012-01-01
Abstract:A novel internal electric field enhanced retention model for localized charge trapping memory devices is proposed to explain the reliability degradation. According to the model, the excitation energy level distribution profiles of trapped holes after different P/E cycling stress are demonstrated for the first time.
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