Pick-and-place process for sensitivity improvement of the capacitive type CMOS MEMS 2-axis tilt sensor
Chun-I Chang,Ming-Han Tsai,Yu-Chia Liu,Chih-Ming Sun,Weileun Fang
DOI: https://doi.org/10.1088/0960-1317/23/9/095029
2013-08-28
Journal of Micromechanics and Microengineering
Abstract:This study exploits the foundry available complimentary metal-oxide-semiconductor (CMOS) process and the packaging house available pick-and-place technology to implement a capacitive type micromachined 2-axis tilt sensor. The suspended micro mechanical structures such as the spring, stage and sensing electrodes are fabricated using the CMOS microelectromechanical systems (MEMS) processes. A bulk block is assembled onto the suspended stage by pick-and-place technology to increase the proof-mass of the tilt sensor. The low temperature UV-glue dispensing and curing processes are employed to bond the block onto the stage. Thus, the sensitivity of the CMOS MEMS capacitive type 2-axis tilt sensor is significantly improved. In application, this study successfully demonstrates the bonding of a bulk solder ball of 100??m in diameter with a 2-axis tilt sensor fabricated using the standard TSMC 0.35??m 2P4M CMOS process. Measurements show the sensitivities of the 2-axis tilt sensor are increased for 2.06-fold (x-axis) and 1.78-fold (y-axis) after adding the solder ball. Note that the sensitivity can be further improved by reducing the parasitic capacitance and the mismatch of sensing electrodes caused by the solder ball.
engineering, electrical & electronic,nanoscience & nanotechnology,instruments & instrumentation,physics, applied