Monolithic Integration Of A Micromachined Flow Sensor Based On Post-Cmos

Dan Li,Fang Yang,Danqi Zhao,Ting Li,Dacheng Zhang
DOI: https://doi.org/10.1016/j.proeng.2012.09.318
2012-01-01
Abstract:This paper investigates design, fabrication and testing of a monolithic piezoresistive flow sensor with on-chip signal conditioning circuit. Post-CMOS Processing of this flow sensor will be the focus of this paper, starting from theoretical analysis and numerical simulation, and moving to experimental verification. The flow sensor presented here is comprised of four symmetrically arranged silicon diaphragms with piezoresistors on them used to sense the drag force induced by the input gas flow. Piezoresistor fabrication has been merged into a conventional CMOS process and releasing of sensing part is conducted after CMOS processing. An integrated flow sensor with on-chip CMOS circuitry fabricated using this novel post-CMOS process was fabricated and tested. The integration method shows good compatibility of MEMS process with the state of art CMOS process. A quadratic relation between output voltage and flow rate was obtained within flow rate of 0-5L/min and the testing result was then compared with an Inter-CMOS based flow sensor. (C) 2012 Elsevier Ltd....Selection and/or peer-review under responsibility of the Symposium Cracoviense Sp. z.o.o.
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