A Piezoresistive Cantilever for Lateral Force Detection Fabricated by a Monolithic Post-Cmos Process

Xu Ji,Zhihong Li,Jianzhong Xi,Juan Li,Yangyuan Wang
DOI: https://doi.org/10.1088/0960-1317/18/11/115001
2008-01-01
Journal of Micromechanics and Microengineering
Abstract:This paper presents a post-CMOS process to monolithically integrate a piezoresistive cantilever for lateral force detection and signal processing circuitry. The fabrication process includes a standard CMOS process and one more lithography step to micromachine the cantilever structure in the post-CMOS process. The piezoresistors are doped in the CMOS process but defined in the post-CMOS micromachining process without any extra process required. A partially split cantilever configuration is developed for the lateral force detection. The piezoresistors are self-aligned to the split cantilever, and therefore the width of the beam is only limited by lithography. Consequently, this kind of cantilever potentially has a high resolution. The preliminary experimental results show expected performances of the fabricated piezoresistors and electronic circuits.
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