Abstract:This paper presents a monolithically integrated aptasensor composed of a piezoresistive microcantilever array and an on-chip signal processing circuit. Twelve microcantilevers, each of them embedded with a piezoresistor, form three sensors in a Wheatstone bridge configuration. The on-chip signal processing circuit consists of a multiplexer, a chopper instrumentation amplifier, a low-pass filter, a sigma-delta analog-to-digital converter, and a serial peripheral interface. Both the microcantilever array and the on-chip signal processing circuit were fabricated on the single-crystalline silicon device layer of a silicon-on-insulator (SOI) wafer with partially depleted (PD) CMOS technology followed by three micromachining processes. The integrated microcantilever sensor makes full use of the high gauge factor of single-crystalline silicon to achieve low parasitic, latch-up, and leakage current in the PD-SOI CMOS. A measured deflection sensitivity of 0.98 × 10 − 6 nm −1 and an output voltage fluctuation of less than 1 μV were obtained for the integrated microcantilever. A maximum gain of 134.97 and an input offset current of only 0.623 nA were acquired for the on-chip signal processing circuit. By functionalizing the measurement microcantilevers with a biotin-avidin system method, human IgG, abrin, and staphylococcus enterotoxin B (SEB) were detected at a limit of detection (LOD) of 48 pg/mL. Moreover, multichannel detection of the three integrated microcantilever aptasensors was also verified by detecting SEB. All these experimental results indicate that the design and process of monolithically integrated microcantilevers can meet the requirements of high-sensitivity detection of biomolecules.

Process-Induced Stress and Hydrogen Effects on Monolithic Integrated CMOS-MEMS Micro-Bimaterial Cantilever Sensor Array

Process-induced stress and hydrogen effects on monolithic integrated BiCMOS-MEMS resonators

Fabrication of monolithic integrated bimaterial resonant uncooled IR sensor

Study on Compatible Cmos-Mems Process with Surface Micromachining for the Application of Monolithic Integration

Fabrication and Characterization of Sio2 Microcantilever for High Sensitive Moisture Sensor

Micromachined SiO 2 microcantilever for high sensitive moisture sensor

Design of High-Sensitivity Cantilever and Its Monolithic Integration with CMOS Circuits

Design of Piezoresistive Micro-Cantilever with Stress Concentration Regions

Inter-CMOS process for monolithic integrated MEMS resonator

Design and Application of a Metal Wet-Etching Post-Process for the Improvement of CMOS-MEMS Capacitive Sensors

Fabrication of Monolithic Integrated MEMS Resonator with Wet-Release-monitoring Array

Monolithic Integration of Capacitive Sensors Using A Double-Side Cmos Mems Post Process

Monolithic Integration Of A Micromachined Flow Sensor Based On Post-Cmos

Post-CMOS Process for High-Aspect-ratio Monolithically Integrated Single Crystal Silicon Microstructures

Fabrication of a Novel Cantilever-Based Device by Release the Stress in a Reliable Way

A Piezoresistive Cantilever for Lateral Force Detection Fabricated by a Monolithic Post-Cmos Process

A Monolithically Integrated Microcantilever Biosensor Based on Partially Depleted SOI CMOS Technology

A hybrid polymer/ceramic/semiconductor fabrication platform for high-sensitivity fluid-compatible MEMS devices with sealed integrated electronics

Microdevice Array Design and Fabrication in Monolithic MEMS SoC

A CMOS Compatible Process for Monolithic Integration of High-Aspect-ratio Bulk Silicon Microstructures