Photoluminescence of Erbium–oxygen-Codoped Silicon Multilayers Prepared by Molecular Beam Epitaxy

F Xu,YL Fan,ZM Jiang
DOI: https://doi.org/10.1016/j.tsf.2005.08.228
IF: 2.1
2006-01-01
Thin Solid Films
Abstract:Erbium–oxygen-codoped silicon multilayer film, which consists of alternate erbium–oxygen-codoped silicon layers and oxygen-doped silicon layers, was synthesized by molecular beam epitaxy. Er3+-related luminescence from erbium–oxygen-codoped multilayer film is stronger than that of erbium–oxygen-codoped monolayer film and shows a weak temperature quenching behaviour. These improvements may be explained by the effect of O-doped Si layers in the multilayer film. The O-doped Si layers have a wide gap which prohibits the energy backtransfer effectively. At the same time, photogenerated carriers from silicon nanocrystals in O-doped Si layers could transfer the energy to neighboring Er3+ ions in Er–O-codoped Si layers by a tunneling process, thus enhancing the Er3+-related luminescence.
What problem does this paper attempt to address?