Near-infrared Luminescence of Erbium Doped Ga2O3 Films and Devices Based on Silicon: Realization of Energy Transfer

Houwei Pang,Majun He,Jie Hu,Yuxuan Fan,Huabao Shang,Dongsheng Li,Deren Yang
DOI: https://doi.org/10.1016/j.optmat.2022.112462
IF: 3.754
2022-01-01
Optical Materials
Abstract:1.54 mu m photoluminescence and electroluminescence are achieved from erbium doped Ga2O3 films on silicon substrates and corresponding devices fabricated by sputtering, respectively. Efficient energy transfer between Ga2O3 and erbium ions is realized in optical pumping, with the energy transfer efficiency of 54.9%. The ~ 1.54 mu m electroluminescence of erbium ions here is proved to originate from indirect excitation, different from the conventional impact excitation by hot electrons. Herein, the light emitting devices present a turn-on voltage of similar to 13 V and onset electric field of 1.4 MV/cm. This work demonstrates the potential of preparing practical electrical-driven silicon-based light sources from erbium doped Ga2O3 films.
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