Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

Synthesis of Crystalline Carbon Nitride by Microwave Plasma Chemical Vapor Deposition

Crystalline Carbon Nitride Films Prepared by Microwave Plasma Chemical Vapour Deposition

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Crystalline Β-C3n4 Synthesized by MPCVD

Synthesis of Crystalline C3N4 by MPCVD

Crystalline Carbon Nitride Film Synthesized by Ion Beam Assisted Magnetron Sputtering and Thermal Annealing in Nitrogen Gas

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Preliminary Synthesis of Carbon Nitride Thin Films by N$_2$/CH$_4$ Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films

Ion beam synthesis of C-N crystalline film and its analysis

Carbon Nitride Films Synthesized By Nh3-Ion-Beam-Assisted Deposition

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Formation of Cubic C3N4 Thin Films by Plasma Enhanced Chemical Vapor Deposition

Two-Phase Nanostructured Carbon Nitride Films Prepared by Direct Current Magnetron Sputtering and Thermal Annealing

Structures and bonding properties of carbon nitride films prepared by radio frequency magnetron sputtering

Investigation of carbon nitride films by cathodic arc evaporation

Formation of Silicon Carbon Nitride Crystals and Aligned Silicon Carbon Nitride Microrods by Microwave Plasma Chemical Vapor Deposition

Investigations on Structural Properties of Carbon Nitride Films Synthesized by Reactive Ionized Cluster Beam Deposition

Formation of Β-C3n4 Phase in C-N Films Deposited by Reactive Ionized Cluster Beam Method

Synthesis of Carbon Nitride Nanocrystals on Co/Ni-covered Substrate by Nitrogen-Atom-beam-assisted Pulsed Laser Ablation

Growth of Ni/Co-catalyzed crystalline CNx thin films by nitrogen-plasma-assisted pulsed laser deposition