Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

Structures and bonding properties of carbon nitride films prepared by radio frequency magnetron sputtering

Optical & Electronic Properties of Carbon Nitride Thin Films

Characteristics of Carbon Nitride Films Synthesized by Single-Source Ion Beam Enhanced Deposition System

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Chemical Bonding, Structure, And Hardness Of Carbon Nitride Thin Films

Investigation of carbon nitride films by cathodic arc evaporation

Structure and properties of carbon nitride films synthesized by low energy ion bombardment

Atomic and Electronic Structure of A Carbon Nitride Compound Prepared by Magnetron Sputtering

Crystalline Carbon Nitride Films Prepared by Microwave Plasma Chemical Vapour Deposition

Spectra Characterization of Silicon Carbonitride Thin Films by Reactive Radio Frequency Sputtering

Investigations on Structural Properties of Carbon Nitride Films Synthesized by Reactive Ionized Cluster Beam Deposition

Electronic Structure of Carbon Nitride Thin Films Studied by X-ray Spectroscopy Techniques

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Ion-beam-assisted Deposition of CNx Films

Two-Phase Nanostructured Carbon Nitride Films Prepared by Direct Current Magnetron Sputtering and Thermal Annealing

Crystallization By Post-Treatment Of Reactive R.F.-Magnetron-Sputtered Carbon Nitride Films

Crystalline Carbon Nitride Film Synthesized by Ion Beam Assisted Magnetron Sputtering and Thermal Annealing in Nitrogen Gas

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Crystalline Carbon Nitride Films Grown By Microwave Plasma Chemical Vapor Deposition