Two-Phase Nanostructured Carbon Nitride Films Prepared by Direct Current Magnetron Sputtering and Thermal Annealing

D. G. Liu,J. P. Tu,C. F. Hong,C. D. Gu,S. X. Mao
DOI: https://doi.org/10.1016/j.surfcoat.2010.06.022
2010-01-01
Abstract:Two-phase nanocrystalline/amorphous carbon nitride films have been successfully prepared by direct current magnetron sputtering and the following thermal annealing at 1000K. The analysis of Raman spectra supports the existence of sp3-hybridized C–N bonds in the films. The results obtained from X-ray photoelectron spectroscopy (XPS) indicate that the fractional concentration of the tetrahedral bonded crystalline phase in the carbon nitride films is 40%, and the ratio of N:C in the tetrahedral bonded crystalline phase is 1.12:1. Transmission electron microscopy (TEM) investigations indicate that the films contain a very dense and homogenous distribution of nanocrystalline grains, and the lattice parameters of these crystalline phases are in good agreement with the theoretically predicted β-C3N4 lattice constant. The films deposited on Si substrates have a high hardness of 40GPa, and the correlations between the microstructure of the films and their mechanical properties are discussed.
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