Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

Preliminary Synthesis of Carbon Nitride Thin Films by N$_2$/CH$_4$ Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films

Crystalline Carbon Nitride Films Grown By Microwave Plasma Chemical Vapor Deposition

Synthesis of Crystalline Carbon Nitride by Microwave Plasma Chemical Vapor Deposition

Crystalline Carbon Nitride Films Prepared by Microwave Plasma Chemical Vapour Deposition

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Characterization of Carbon Nitride Deposition from CH4∕N2 Glow Discharge Plasma Beams Using Optical Emission Spectroscopy

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Investigation of carbon nitride films by cathodic arc evaporation

Carbon Nitride Films Synthesized By Nh3-Ion-Beam-Assisted Deposition

Preparation of Crystalline Carbon Nitride Films on Silicon Substrate by Chemical Vapor Deposition

Optical & Electronic Properties of Carbon Nitride Thin Films

Characterization of carbon nitride deposition from CH#14#2/N#12#2 glow discharge plasma beams using optical emission spectroscopy

Growth of Ni/Co-catalyzed crystalline CNx thin films by nitrogen-plasma-assisted pulsed laser deposition

Synthesis of Carbon Nitride Films by Arc-Heated Atomic Nitrogen Beams Assisted Pulsed Laser Ablation

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Ion-beam-assisted Deposition of CNx Films

Synthesis of C3N4+ by the Combination of Laser Ablation of Graphite and N2 Molecular Beam

Formation of Cubic C3N4 Thin Films by Plasma Enhanced Chemical Vapor Deposition

Synthesis and Thermal Decomposition of Carbon Nitride Films Prepared by Nitrogen Ion Implantation into Graphite

Crystalline Carbon Nitride Film Synthesized by Ion Beam Assisted Magnetron Sputtering and Thermal Annealing in Nitrogen Gas