Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

Characterization of Carbon Nitride Deposition from CH4∕N2 Glow Discharge Plasma Beams Using Optical Emission Spectroscopy

Characterization of carbon nitride deposition from CH#14#2/N#12#2 glow discharge plasma beams using optical emission spectroscopy

Characterization of A-C:H:n Deposition from CH4/N2 Rf Plasmas Using Optical Emission Spectroscopy

Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Spectroscopic Study on Pulsed Laser Ablation of Graphite Target in Ecr Nitrogen Plasma for Carbon Nitride Film Deposition

Understanding growth of carbon nanowalls at atmospheric pressure using normal glow discharge plasma-enhanced chemical vapor deposition

Preliminary Synthesis of Carbon Nitride Thin Films by N$_2$/CH$_4$ Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films

Growth of Ni/Co-catalyzed crystalline CNx thin films by nitrogen-plasma-assisted pulsed laser deposition

Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Study On Re-Sputtering During Cnx Film Deposition Through Spectroscopic Diagnostics Of Plasma

Thermal Stability of Carbon Nitride Thin Films Prepared by Electron Cyclotron Resonance Plasma Assisted Pulsed Laser Deposition

Investigation of carbon nitride films by cathodic arc evaporation

Ion-beam-assisted Deposition of CNx Films

Preparation and Characterisation of Carbon Nitride Films Deposited by Pulsed Laser Arc Deposition

Effect of CN and CH radicals on diamond and carbon nanotubes growth in MECVD

Synthesis of C3N4+ by the Combination of Laser Ablation of Graphite and N2 Molecular Beam

Optical emission spectroscopy study of the influence of nitrogen on carbon nanotube growth

Characterization and modification of carbon nitride films deposited by laser ablation under low energy ion‐beam bombardment

Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Optical & Electronic Properties of Carbon Nitride Thin Films