The Distribution of Density of Gap States for Phosphorus Doped Amorphous Silicon Measured by DLTS

Du Yongchang,Zhang Yufeng,Yang Datong,Zhang Guanghua,Han Ruqi
DOI: https://doi.org/10.1007/bf02783202
1985-01-01
Abstract:A density-of-state distribution in pseudo-gap of phosphorus-dopeda-Si: H material prepared by glow-discharge method has been measured experimentally by deep level transient spectroscopy. A minimum value of 7×1015 cm−3 eV−1 has been obtained at the energy of about 0.5 eV belowE c. This physical picture is quite different from the previous one obtained by field effect. Some comments on the method and the theoretical analysis are given.
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