Optical Studies of High-Field Carrier Transport of InN Thick Film Grown on GaN

KT Tsen,C Poweleit,DK Ferry,H Lu,WJ Schaff
DOI: https://doi.org/10.1016/j.jcrysgro.2005.12.009
IF: 1.8
2006-01-01
Journal of Crystal Growth
Abstract:Transient Raman spectroscopy has been used to study electron transport in an InN film grown on GaN at T=300K. Our experimental results demonstrate that under the subpicosecond laser excitation and probing, electron drift velocity of carriers in the Γ valley can exceed its steady-state value by as much as 40%. Electron velocities have been found to cut off at around 2×108cm/s, significantly larger than those observed for other III–V semiconductors such as GaAs and InP. These experimental results suggest that InN is potentially an excellent material for ultrafast electronic devices.
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