Field-Induced Nonequilibrium Electron Distribution And Electron Transport In A High-Quality Inn Thin Film Grown On Gan

w liang,k t tsen,d k ferry,hai lu,w j schaff
DOI: https://doi.org/10.1063/1.1739509
IF: 4
2004-01-01
Applied Physics Letters
Abstract:Nonequilibrium electron transport in a high-quality, single-crystal, wurtzite structure InN thin film grown on GaN has been investigated by picosecond Raman spectroscopy. Our experimental results show that an electron drift velocity as high as (5.0+/-0.5)x10(7) cm/s can be achieved at T=300 K. The experimental results have been compared with ensemble Monte Carlo simulations and good agreement is obtained. From the comparison, we have also deduced that the built-in electric-field intensity inside our InN thin-film system is about 75 kV/cm. (C) 2004 American Institute of Physics.
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