Ultrafast Raman Scattering Studies of Electron Transport in A Thick Inn Film Grown on Gan

K. T. Tsen,C. Poweleit,D. K. Ferry,Hai Lu,William J. Schaff
DOI: https://doi.org/10.1117/12.651190
2006-01-01
Abstract:Transient Raman spectroscopy has been used to study electron transport in a thick InN film grown on GaN at T = 300 K. Our experimental results demonstrate that under the subpicosecond laser excitation and probing, electron drift velocity in the F valley, which reaches as high as 7.5x10(7) cm / sec, can exceed its steady state value by as much as 40%. Electron velocities have been found to cut off at around 2x10(8) cm / s, significantly larger than those observed for other III-V semiconductors such as GaAs and InP. Our experimental results suggest that InN is potentially an excellent material for ultrafast electronic devices.
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